Thin Film Deposition

Precision Sputtering Systems

We engineer turnkey RF and DC sputtering systems used for depositing uniform thin films of metals, oxides, nitrides and complex multilayers. Each system is built around a high-vacuum chamber with integrated RF/DC power supplies, matching networks, mass flow controllers and PLC-based recipe management.

Configurable from single-target compact research units to multi-target production lines with substrate heating, biasing and rotation — fully software controlled via touchscreen HMI.