Precise gas flow control for thin-film deposition, semiconductor processes, vacuum systems and research instrumentation — single MFCs and multi-gas distribution panels.
Power Control System supplies and integrates Mass Flow Controllers (MFCs) for accurate, repeatable gas dosing across vacuum, sputtering, CVD, PECVD, and analytical instruments. We offer thermal and pressure-based MFCs from leading OEMs.
Our gas distribution panels bundle multiple MFCs with isolation valves, check valves, filters, regulators and a digital readout / PLC interface — pre-piped and leak-tested in our facility.
Whether single-channel or multi-gas distribution skids — we build to your process specs.
Choose thermal MFCs for general gases or pressure-based MFCs for corrosive/specialty gases.
Every gas line helium leak-tested to 10â»â¹ mbar·L/s before dispatch.
Settling time < 1 second for rapid setpoint changes in dynamic processes.
4/8/16-channel readouts with totalizer, alarms and RS-485 / Ethernet communication.
Pre-piped SS-316 manifold panels with isolation valves, check valves, filters & regulators.
Seamless integration with PLC / SCADA for recipe-based gas sequencing & data logging.
Etch, deposition
Reactive gas dosing
Precursor delivery
GC, mass spec carrier gas
Furnace atmosphere
Aeration, COâ‚‚ dosing
Inert / reactive atmospheres
Custom gas mixing rigs